What are the advantages of high-energy pulse PVD technology compared to traditional PVD?

High energy pulse PVD technology has the following advantages compared to traditional PVD:

In terms of film quality

Higher density:High energy pulse PVD can generate high-density plasma during the deposition process,giving deposited particles higher energy and forming a denser film layer on the substrate.For example,in the preparation of hard coatings,the resulting film structure is more compact,with lower porosity,which can effectively block the invasion of external substances and improve the protective performance of the film layer

Stronger membrane substrate adhesion:The high-energy plasma generated by this technology can better bombard,clean,and activate the substrate surface,enhance the chemical bonding between the membrane layer and the substrate,and make the membrane substrate adhesion more firm.In the application of tool coating,it can significantly reduce the risk of coating detachment during tool use and extend the service life of the tool

High energy pulse PVD

Better thickness uniformity:By controlling the parameters of high-energy pulses,high uniformity of film thickness can be achieved.Compared to traditional PVD technology,coating on large-area substrates or complex shaped workpiece surfaces can achieve more uniform coverage,ensuring consistent film performance across the entire surface,which is beneficial for improving the overall quality and performance stability of the product

In terms of sedimentation efficiency

Faster deposition rate:High energy pulse PVD technology concentrates power within short pulses,generating more plasma per unit time,thereby increasing the sputtering and deposition rates of the target material.Taking the preparation of certain metal thin films as an example,their deposition rate can be several times higher than traditional PVD technology,greatly improving production efficiency and reducing production costs

In terms of process flexibility

A wider range of materials can be prepared:Traditional PVD technology may be limited in preparing thin films of materials with high melting points,high hardness,or special chemical properties.High energy pulse PVD technology can provide higher energy,allowing it to process a wider range of materials,including some refractory metals,ceramic materials,composite materials,etc.,providing a broader space for the research and application of new materials

Controllable film performance:By adjusting the parameters of high-energy pulses,such as pulse width,frequency,power,etc.,the characteristics of plasma and the energy of deposited particles can be accurately controlled,thereby achieving fine control over the microstructure,chemical composition,physical properties,etc.of the film.For example,thin films with specific hardness,roughness,optical properties,electrical properties,etc.can be prepared according to different application requirements to meet various complex engineering application requirements

In terms of environmental protection and energy conservation

More environmentally friendly:High energy pulse PVD technology is usually carried out at lower working pressures,reducing the consumption of working gases and minimizing environmental pollution.Meanwhile,due to the fact that a large amount of chemical reagents are not required during its sedimentation process,the generation and treatment of chemical waste liquids are avoided,which is in line with the development trend of modern green manufacturing

Energy consumption reduction:Compared with traditional PVD technology,high-energy pulse PVD can often operate at lower power while achieving the same film performance,thereby reducing equipment energy consumption and saving energy costs.