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What is the purpose of the surface pretreatment of the coating boundary in the coating process?
We all know that nanoparticles have self aggregation effect due to their large surface energy. On a flat surface, a layer of nanoparticles is stacked on the surface. With the rise of temperature,
Corrosion of cathode by plasma of different reactive gases in cathode arc discharge
Cathodic arc discharge has been often used to deposit different metal films. In addition to Ar, which is commonly used for direct sputtering of target materials to deposit corresponding metal films,
Influence of different precursor gases on DLC film
In the process of DLC film preparation, hydrocarbon precursor gases are used, and different precursors have different effects on the performance of the film.
Comparative study on the discharge of HiPIMS with or without local ionization zone
Due to the constraint of magnetic field and the ultra-high power discharge, the high-power pulsed magnetron sputtering technology (HiPIMS) has the unstable phenomenon of glow flicker due to the partial discharge enhancement during the discharge process.
Sio2-ta2o5 optical interference films were prepared by HiPIMS reaction sputtering
When Si target and Ta target oxygen reaction sputtering, the intake hysteresis loop can be inhibited by using appropriate HiPIMS pulse parameters, and the process stability can be ensured even without gas controller.
