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Language 
中文
Advantage:
Enhanced electron emission, thereby obtaining high plasma density, high ionization rate and high deposition rate, which will help to increase the density of the film and reduce the stress of the film;
It can be deposited at low temperature, reducing the thermal stress of the workpiece and improving the life of the workpiece;
It can inhibit cathodic arc target poisoning, improve the film structure, and control the particle pollution of the film;
Increase arc stability and improve target utilization;
The new pulsed cathodic arc power source of Xinbo company realizes pulse-enhanced electron emission to increase the plasma density in the vacuum chamber. The core of the power supply is composed of a pulse emission and maintenance current system, which is controlled and managed by a single chip microcomputer and a touch screen system. It has the functions of arc extinguishing detection, automatic restart, overcurrent protection, overheating control and fault detection.